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The mission of the Electro-Optic (EO) Materials and Process Technology Division is to advance the state-of-the-art in technologies used for the production, processing, and characterization of electronic, optical, and electro-optic materials. The Division fulfills this mission through:
- Leading edge research in novel crystal materials and crystal growth technologies
- Establishment of pilot scale process demonstration facilities and prototype fabrication capabilities
- Education and training of students and industry workforce in EO technologies
- Transfer of these DoD critical technologies into commercial production
Research Areas Include:
- Pilot scale bulk crystal growth of wide band gap semiconductors and high temperature piezoelectric materials
- Bulk crystal growth process modeling
- Thin film crystal growth; multifunctional integration
- Advanced heat spreader materials, heat sink design, and finite element simulation
- Prototype device fabrication for power electronics
- Optics finishing, sub-surface damage assessment, and mitigation
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| capabilities & Thrusts... |
Capabilities:
- Bulk Crystal Growth (PVT, CVD, HCVD, Czochralski, Vertical Bridgman)
- Integrated Oxide and Nitride Molecular Beam Epitaxy
- Crystal Slicing, Dicing, and Polishing (CMP)
- Materials Characterization (AFM, SEM, Interferometry, Contactless Resistivity Mapping (COREMA), Microwave Loss)
- Optics Fabrication, Finishing, and Metrology
- Finite Element Computational Tools for Process Simulation
Thrusts:
- Bulk Crystal Growth Process Development of Electronic, Optical, and Piezoelectric Materials
- Thin Film Crystal Growth of III-nitrides and Ferroelectric Oxides
- Characterization of EO Material Properties; Prototype Fabrication
- Thermal modeling and thermal management of electronic and EO devices and packaging
- Simulation of EO Crystal Growth Processes and Optimization of Manufacturing Process Conditions
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